- UID
- 22780
- 精华
- 积分
- 349
- 胶币
- 个
- 胶分
- 点
- 技术指数
- 点
- 阅读权限
- 20
- 在线时间
- 小时
- 注册时间
- 2008-9-25
- 最后登录
- 1970-1-1
|
马上注册,结交更多胶友,享用更多功能!
您需要 登录 才可以下载或查看,没有账号?注册
×
请高手帮忙翻译,是半导体制造行业用橡胶件的技术文件
7 N# x/ Y: L: H5 P( K1 @( ?% R Kalrez® 8002 is a clear, transparent product targeted specifically for select semiconductor plasma and gas deposition applications, i.e. etching, ashing, HDPCVD, PECVD, SACVD, etc. This unfilled product offers ultra-low particle generation in oxygen and fluorine-based plasmas versus mineral-filled products. Kalrez® 8002 exhibits excellent resistance to dry process chemistry, has good mechanical strength properties and is well suited for static, low stress/low sealing force and select bonded door seal applications. A maximum continuous service temperature of 275°C (527°F) is suggested. Ultrapure post cleaning and packaging is standard for parts made from Kalrez® 8002.4 F2 ^. ]$ j5 k) c( b
Performance Features/Benefits
2 ?! c. r1 O6 Z n5 y9 |0 r• Ultra-low particle generation in oxygen and fluorine-based plasmas/ ]: u+ ?& R5 ]5 ~ a6 M& r7 X
• Excellent (low) compression set properties
9 F; G+ W# a$ I3 w% b• Excellent thermal stability- ^* Q5 C2 o3 G$ K& [+ D, g
• Excellent resistance to dry process chemistry5 j8 F. x8 j( Q1 s: }9 X5 `+ B5 X
Suggested Applications
3 y) ~4 P5 [6 G2 w% x) y• Gas inlet seals
5 ?( g+ I2 H9 a• Gas orifice seals0 r0 W$ t0 [2 r0 i3 U7 g
• Gas feedthrough seals
$ X9 y+ i! J% d* x9 Z# b* d# Y• Select slit valve bonded door seals
0 q; F7 w/ J) G; P* J) e( O• Other static and low stress/low sealing force applications, H4 x- O* V( g L- F
Kalrez® 8002 has been reported to significantly improve wafer production in semiconductor HDPCVD, SACVD and PECVD applications where fluorinated plasmas, i.e., NF3, C3F8, etc. are used during the cleaning cycle. In a number of evaluations at fabline customers, Kalrez 8002 exhibited improved crack resistance, lower particle generation and longer seal life compared to competitive perfluoroelastomers in both static and dynamic sealing applications. |
|